Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10509318 | Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article | — | 2019-12-17 |
| 10394122 | Resist composition, method for forming resist pattern, compound, and acid generator | Issei Suzuki, Masahito Yahagi, Yuki FUKUMURA, Yoshitaka Komuro, Toshikazu Takayama +2 more | 2019-08-27 |