Issued Patents 2019
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10515955 | Methods of manufacturing transistor gate structures by local thinning of dummy gate stacks using an etch barrier | Chih-Han Lin, Kuei-Yu Kao, Shih-Yao Lin, Chao-Cheng Chen, Syun-Ming Jang | 2019-12-24 |
| 10510894 | Isolation structure having different distances to adjacent FinFET devices | Chang-Yun Chang, Shu-Yuan Ku | 2019-12-17 |
| 10505014 | Vertical device having a protrusion source | De-Fang Chen, Teng-Chun Tsai, Cheng-Tung Lin, Li-Ting Wang, Chun-Hung Lee +1 more | 2019-12-10 |
| 10468527 | Metal gate structure and methods of fabricating thereof | I-Wei Yang, Chih-Chang Hung, Shu-Yuan Ku, Ryan Chia-Jen Chen | 2019-11-05 |
| 10460994 | Residue-free metal gate cutting for fin-like field effect transistor | Ya-Yi Tsai, Yi-Hsuan Hsiao, Shu-Yuan Ku, Ryan Chia-Jen Chen | 2019-10-29 |
| 10332991 | Metal gate electrode of a semiconductor device | Jr-Jung Lin, Chih-Han Lin, Jin-Aun Ng, Chao-Cheng Chen | 2019-06-25 |
| 10325912 | Semiconductor structure cutting process and structures formed thereby | Ryan Chia-Jen Chen, Li-Wei Yin, Tzu-Wen Pan, Yi-Chun Chen, Cheng-Chung Chang +2 more | 2019-06-18 |
| 10269787 | Metal gate structure cutting process | Shiang-Bau Wang, Shu-Yuan Ku, Ryan Chia-Jen Chen | 2019-04-23 |
| 10269581 | Method of fabricating a semiconductor structure | Tzu-Yen Hsieh, Chia-Wei Chang, Chao-Cheng Chen, Chun-Hung Lee, Dai-Lin Wu | 2019-04-23 |
| 10236220 | Fin field-effect transistor device and method | Bao-Ru Young, Yu-Chao Lin | 2019-03-19 |