Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10515966 | Enhanced channel strain to reduce contact resistance in NMOS FET devices | Yu-Chang Lin, Huicheng Chang, Hou-Yu Chen, Yong-Yan Lu | 2019-12-24 |
| 10510619 | Semiconductor structure and method for manufacturing the same | Yu-Chang Lin, Shih-Hsiang Chiu, Tien-Shun Chang, Huicheng Chang | 2019-12-17 |
| 10460940 | Mask formation by selectively removing portions of a layer that have not been implanted | Tien-Shun Chang, Huicheng Chang | 2019-10-29 |
| 10326003 | FinFET device and methods of forming | Chia-Cheng Chen, Huicheng Chang, Liang-Yin Chen, Li-Ting Wang, Wan-Yi Kao +1 more | 2019-06-18 |