Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10274820 | Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same | Hwanchul JEON, Munja Kim, Sungwon Kwon, Byunggook Kim, Roman Chalykh +1 more | 2019-04-30 |
| 10224178 | Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices | Sungwon Kwon, Heebom Kim, Donggun Lee | 2019-03-05 |