Issued Patents 2019
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10224178 | Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices | Yongseok Jung, Sungwon Kwon, Heebom Kim | 2019-03-05 |