Issued Patents 2019
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10407594 | Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine | Bastian Marten Noller, Yuzhuo Li, Diana Franz, Michael Lauter, Daniel Kwo-Hung Shen +2 more | 2019-09-10 |