Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10407594 | Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine | Bastian Marten Noller, Diana Franz, Kenneth Rushing, Michael Lauter, Daniel Kwo-Hung Shen +2 more | 2019-09-10 |
| 10392531 | Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process | Vijay Immanuel Raman, Sophia Ebert, Mario Brands, Yongqing Lan, Philipp Zacharias +1 more | 2019-08-27 |
| 10214663 | Chemical-mechanical polishing composition comprising organic/inorganic composite particles | Yongqing Lan, Bastian Marten Noller, Liang Jiang, Daniel Kwo-Hung Shen, Reza Golzarian | 2019-02-26 |