Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10407594 | Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine | Yuzhuo Li, Diana Franz, Kenneth Rushing, Michael Lauter, Daniel Kwo-Hung Shen +2 more | 2019-09-10 |
| 10227506 | Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium | Max Siebert, Michael Lauter, Yongqing Lan, Robert REICHARDT, Alexandra Muench +4 more | 2019-03-12 |
| 10214663 | Chemical-mechanical polishing composition comprising organic/inorganic composite particles | Yongqing Lan, Yuzhuo Li, Liang Jiang, Daniel Kwo-Hung Shen, Reza Golzarian | 2019-02-26 |