Issued Patents 2019
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10381452 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland | 2019-08-13 |
| 10374048 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland | 2019-08-06 |
| 10367072 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland | 2019-07-30 |