Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10381452 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw | 2019-08-13 |
| 10374048 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw | 2019-08-06 |
| 10367072 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw | 2019-07-30 |
| 10256139 | Chemoepitaxy etch trim using a self aligned hard mask for metal line to via | Markus Brink, Michael A. Guillorn, HsinYu Tsai | 2019-04-09 |