Issued Patents 2019
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10381452 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw | 2019-08-13 |
| 10374048 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw | 2019-08-06 |
| 10367072 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw | 2019-07-30 |
| 10256152 | Methods of making FinFET device comprising a piezoelectric liner for generating a surface charge | Qun Gao, Naved Siddiqui | 2019-04-09 |
| 10242906 | Semiconductor structure with integrated passive structures | Arvind Kumar, Renee T. Mo, Shreesh Narasimha | 2019-03-26 |