Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10522329 | Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus | Christoph Spengler, Wolf Naetar | 2019-12-31 |
| 10410831 | Multi-beam writing using inclined exposure stripes | — | 2019-09-10 |
| 10325756 | Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer | — | 2019-06-18 |
| 10325757 | Advanced dose-level quantization of multibeam-writers | Christoph Spengler, Hanns Peter Petsch | 2019-06-18 |