Issued Patents 2019
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10509313 | Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography | Weijun Liu, Fen Wan | 2019-12-17 |
| 10488753 | Substrate pretreatment and etch uniformity in nanoimprint lithography | Weijun Liu, Fen Wan, Gary F. Doyle, Niyaz Khusnatdinov | 2019-11-26 |
| 10481491 | Fluid droplet methodology and apparatus for imprint lithography | Edward Brian Fletcher | 2019-11-19 |
| 10317793 | Substrate pretreatment compositions for nanoimprint lithography | Weijun Liu, Fen Wan | 2019-06-11 |
| 10189188 | Nanoimprint lithography adhesion layer | Fen Wan, Weijun Liu | 2019-01-29 |