Issued Patents 2018
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10160091 | CMP polishing head design for improving removal rate uniformity | Te-Chien Hou, Ching-Hong Jiang, Kuo-Yin Lin, Ming-Shiuan She, Teng-Chun Tsai +1 more | 2018-12-25 |
| 10144109 | Polisher, polishing tool, and polishing method | Teng-Chun Tsai, Yung-Cheng Lu, Chia-Chiung Lo, Shwang-Ming Jeng, Yee-Chia Yeo | 2018-12-04 |
| 9962801 | Systems and methods for performing chemical mechanical planarization | Teng-Chun Tsai, Yung-Cheng Lu | 2018-05-08 |