Issued Patents 2018
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10146130 | Composition for base, and directed self-assembly lithography method | Hiroyuki Komatsu, Takehiko Naruoka, Shinya Minegishi, Kaori Sakai | 2018-12-04 |
| 10120282 | Chemically amplified resist material and resist pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka | 2018-11-06 |
| 10073348 | Resist-pattern-forming method and chemically amplified resist material | Hisashi Nakagawa, Takehiko Naruoka, Seiichi Tagawa, Akihiro Oshima, Seiji Nagahara | 2018-09-11 |
| 10073349 | Chemically amplified resist material, pattern-forming method, compound, and production method of compound | Hisashi Nakagawa, Takehiko Naruoka, Seiichi Tagawa, Akihiro Oshima, Seiji Nagahara | 2018-09-11 |
| 10018911 | Chemically amplified resist material and resist pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka | 2018-07-10 |
| 9989849 | Chemically amplified resist material and resist pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka | 2018-06-05 |
| 9971247 | Pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka, Seiichi Tagawa, Akihiro Oshima, Seiji Nagahara | 2018-05-15 |
| 9939729 | Resist pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka | 2018-04-10 |