Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9922831 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland | 2018-03-20 |
| 9859122 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland | 2018-01-02 |