Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10082736 | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning | Ekmini Anuja De Silva, Karen E. Petrillo | 2018-09-25 |
| 10049876 | Removal of trilayer resist without damage to underlying structure | Muthumanickam Sankarapandian, Soon-Cheon Seo, John R. Sporre | 2018-08-14 |