| 10141503 |
Selective phase change material growth in high aspect ratio dielectric pores for semiconductor device fabrication |
Matthew J. BrightSky, Takeshi Masuda |
2018-11-27 |
| 10128185 |
Hybrid subtractive etch/metal fill process for fabricating interconnects |
Gregory M. Fritz, Eric A. Joseph, Hiroyuki Miyazoe |
2018-11-13 |
| 10121676 |
Interconnects fabricated by hydrofluorocarbon gas-assisted plasma etch |
Eric A. Joseph, Joe Lee, Takefumi Suzuki |
2018-11-06 |
| 9977002 |
Nanoporous structures by reactive ion etching |
Yann Astier, Jingwei Bai, Aaron D. Franklin, Joshua T. Smith |
2018-05-22 |
| 9934984 |
Hydrofluorocarbon gas-assisted plasma etch for interconnect fabrication |
Eric A. Joseph, Joe Lee, Takefumi Suzuki |
2018-04-03 |
| 9868119 |
Pillar array structure with uniform and high aspect ratio nanometer gaps |
Yann Astier, Joshua T. Smith, Chao Wang, Benjamin H. Wunsch |
2018-01-16 |
