Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10155886 | Polishing liquid for CMP, and polishing method | Toshio Takizawa, Hisataka Minami, Toshiaki Akutsu, Tomohiro Iwano | 2018-12-18 |
| 9966269 | Polishing liquid for CMP, polishing liquid set for CMP, and polishing method | Shigeru Yoshikawa, Takaaki Tanaka, Takashi Shinoda | 2018-05-08 |