KO

Keiyu OU

FU Fujifilm: 2 patents #161 of 822Top 20%
Overall (2018): #129,717 of 503,207Top 30%
2
Patents 2018

Issued Patents 2018

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10025186 Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device Akiyoshi GOTO, Masafumi KOJIMA, Keita Kato, Michihiro SHIRAKAWA 2018-07-17
9952509 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device Keita Kato, Michihiro SHIRAKAWA, Akiyoshi GOTO, Masafumi KOJIMA 2018-04-24