| 9847247 |
Method for filling gaps of semiconductor device and semiconductor device formed by the same |
Ping Huang, Keng-Jen Lin, Yi-Hui Lin |
2017-12-19 |
| 9793105 |
Fabricating method of fin field effect transistor (FinFET) |
Chun-Wei Yu, Hsu Ting, Chueh-Yang Liu, Kuang-Hsiu Chen, Yi-Liang Ye |
2017-10-17 |
| 9793174 |
FinFET device on silicon-on-insulator and method of forming the same |
Ping Huang, Keng-Jen Lin, Shu-Ming Yeh |
2017-10-17 |
| 9748111 |
Method of fabricating semiconductor structure using planarization process and cleaning process |
Yi-Liang Ye, Kuang-Hsiu Chen, Chueh-Yang Liu |
2017-08-29 |
| 9741818 |
Manufacturing method of semiconductor structure for improving quality of epitaxial layers |
Chueh-Yang Liu, Yu-Ying Lin, I-Cheng Hu, Tien-I Wu, Yu-Shu Lin |
2017-08-22 |
| 9741572 |
Method of forming oxide layer |
Chueh-Yang Liu, Chun-Wei Yu, Yu-Ying Lin |
2017-08-22 |
| 9735235 |
Nanowire and method of fabricating the same |
Tsai-Yu Wen, Chin-Sheng Yang, Chun-Jen Chen, Tsuo-Wen Lu |
2017-08-15 |
| 9728397 |
Semiconductor device having the insulating layers cover a bottom portion of the fin shaped structure |
Hsu Ting, Chun-Wei Yu, Chueh-Yang Liu |
2017-08-08 |
| 9716165 |
Field-effect transistor and method of making the same |
Yu-Ying Lin, Kuan Hsuan Ku, I-Cheng Hu, Chueh-Yang Liu, Shui-Yen Lu +3 more |
2017-07-25 |
| 9685533 |
Transistor with SiCN/SiOCN mulitlayer spacer |
Chia-Ming Kuo, Po-Jen Chuang, Fu-Jung Chuang, Tsai-Yu Wen, Tsuo-Wen Lu +1 more |
2017-06-20 |
| 9685319 |
Method for filling gaps of semiconductor device and semiconductor device formed by the same |
Ping Huang, Keng-Jen Lin, Yi-Hui Lin |
2017-06-20 |
| 9646889 |
Method of removing a hard mask layer on a gate structure while forming a protective layer on the surface of a substrate |
Chun-Wei Yu, Hsu Ting, Chueh-Yang Liu, Kuang-Hsiu Chen |
2017-05-09 |
| 9634083 |
Semiconductor structure and process thereof |
Chien-Liang Lin, Ying-Wei Yen |
2017-04-25 |
| 9633904 |
Method for manufacturing semiconductor device with epitaxial structure |
Yu-Ying Lin, Chueh-Yang Liu, Neng-Hui Yang |
2017-04-25 |
| 9627534 |
Semiconductor MOS device having a dense oxide film on a spacer |
Kuang-Hsiu Chen, Yi-Liang Ye, Chueh-Yang Liu |
2017-04-18 |
| 9613808 |
Method of forming multilayer hard mask with treatment for removing impurities and forming dangling bonds |
Yi-Liang Ye, Kuang-Hsiu Chen, Chueh-Yang Liu |
2017-04-04 |
| 9570315 |
Method of interfacial oxide layer formation in semiconductor device |
Chueh-Yang Liu, Yi-Liang Ye, Ted Ming-Lang Guo |
2017-02-14 |
| 9570578 |
Gate and gate forming process |
Keng-Jen Lin, Chien-Liang Lin, Neng-Hui Yang |
2017-02-14 |
| 9543408 |
Method of forming patterned hard mask layer |
Yi-Hui Lin, Keng-Jen Lin, Chun-Yao Yang |
2017-01-10 |