JL

Jung-I Lin

TSMC: 2 patents #920 of 2,832Top 35%
📍 Baoshan, TW: #56 of 388 inventorsTop 15%
Overall (2017): #136,513 of 506,227Top 30%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9805970 Method for forming deep trench spacing isolation for CMOS image sensors Tai-I Yang, Ta-Chun Lin, Tien-Lu Lin, Chen-Jong Wang 2017-10-31
9559134 Deep trench spacing isolation for complementary metal-oxide-semiconductor (CMOS) image sensors Tai-I Yang, Ta-Chun Lin, Tien-Lu Lin, Chen-Jong Wang 2017-01-31