Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9847302 | Wafer surface conditioning for stability in fab environment | Tsiao-Chen Wu | 2017-12-19 |
| 9558955 | Formation method of semiconductor device that includes performing hydrogen-containing plasma treatment on metal gate stack | Ru-Shang Hsiao, Chi-Cherng Jeng, Chih-Mu Huang, Shin-Yeu Tsai | 2017-01-31 |