Issued Patents 2017
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9558955 | Formation method of semiconductor device that includes performing hydrogen-containing plasma treatment on metal gate stack | Ru-Shang Hsiao, Chi-Cherng Jeng, Chih-Mu Huang, Fang-Wei Lin | 2017-01-31 |