Issued Patents 2017
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9784573 | Positional deviation measuring device, non-transitory computer-readable recording medium containing a positional deviation measuring program, and method of manufacturing semiconductor device | Hidenori Sato, Yosuke Okamoto, Manabu Takakuwa | 2017-10-10 |
| 9772566 | Mask alignment mark, photomask, exposure apparatus, exposure method, and manufacturing method of device | Kazuo Tawarayama | 2017-09-26 |
| 9760017 | Wafer lithography equipment | Kazufumi Shiozawa, Toshihide Kawachi, Masamichi Kishimoto, Yoshimitsu Kato | 2017-09-12 |
| 9741564 | Method of forming mark pattern, recording medium and method of generating mark data | Yuji Setta, Taketo Kuriyama | 2017-08-22 |
| 9703912 | Mask set, fabrication method of mask set, manufacturing method of semiconductor device, and recording medium | Ai FURUBAYASHI, Takashi Obara, Takaki Hashimoto | 2017-07-11 |
| 9632407 | Mask processing apparatus and mask processing method | Hidenori Sato, Manabu Takakuwa, Taketo Kuriyama | 2017-04-25 |