WP

William N. Partlo

AB Asml Netherlands B.V.: 2 patents #117 of 568Top 25%
CY Cymer: 1 patents #10 of 25Top 40%
Overall (2017): #54,692 of 506,227Top 15%
3
Patents 2017

Issued Patents 2017

Patent #TitleCo-InventorsDate
9832853 Alignment of light source focus Matthew R. Graham, Steven Chang, Robert A. Bergstedt 2017-11-28
9669334 Material supply apparatus for extreme ultraviolet light source having a filter constructed with a plurality of openings fluidly coupled to a plurality of through holes to remove non-target particles from the supply material Igor V. Fomenkov, Gregory O. Vaschenko, William Oldham 2017-06-06
9620920 High pulse repetition rate gas discharge laser Walter Dale Gillespie, Thomas D. Steiger, Richard C. Ujazdowski 2017-04-11