JT

Jeff Tsai

Dow Global Technologies: 2 patents #145 of 864Top 20%
RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #13 of 39Top 35%
📍 Zhunan Town, TW: #2 of 8 inventorsTop 25%
Overall (2017): #141,502 of 506,227Top 30%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9770808 Method of manufacturing chemical mechanical polishing pads Francis V. Acholla, Andrew Wank, Mark Gazze, Scott Chang, William A. Heeschen +3 more 2017-09-26
9737971 Chemical mechanical polishing pad, polishing layer analyzer and method Francis V. Acholla, Andrew Wank, Mark Gazze, Scott Chang, William A. Heeschen +3 more 2017-08-22