WH

William A. Heeschen

Dow Global Technologies: 2 patents #145 of 864Top 20%
RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #13 of 39Top 35%
🗺 Michigan: #1,726 of 9,630 inventorsTop 20%
Overall (2017): #93,942 of 506,227Top 20%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9770808 Method of manufacturing chemical mechanical polishing pads Francis V. Acholla, Andrew Wank, Mark Gazze, Scott Chang, Jeff Tsai +3 more 2017-09-26
9737971 Chemical mechanical polishing pad, polishing layer analyzer and method Francis V. Acholla, Andrew Wank, Mark Gazze, Scott Chang, Jeff Tsai +3 more 2017-08-22