SC

Scott Chang

Dow Global Technologies: 2 patents #145 of 864Top 20%
RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #13 of 39Top 35%
Overall (2017): #108,550 of 506,227Top 25%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9770808 Method of manufacturing chemical mechanical polishing pads Francis V. Acholla, Andrew Wank, Mark Gazze, Jeff Tsai, William A. Heeschen +3 more 2017-09-26
9737971 Chemical mechanical polishing pad, polishing layer analyzer and method Francis V. Acholla, Andrew Wank, Mark Gazze, Jeff Tsai, William A. Heeschen +3 more 2017-08-22