| 9793105 |
Fabricating method of fin field effect transistor (FinFET) |
Chun-Wei Yu, Hsu Ting, Yu-Ren Wang, Kuang-Hsiu Chen, Yi-Liang Ye |
2017-10-17 |
| 9748111 |
Method of fabricating semiconductor structure using planarization process and cleaning process |
Yi-Liang Ye, Kuang-Hsiu Chen, Yu-Ren Wang |
2017-08-29 |
| 9741818 |
Manufacturing method of semiconductor structure for improving quality of epitaxial layers |
Yu-Ying Lin, I-Cheng Hu, Tien-I Wu, Yu-Shu Lin, Yu-Ren Wang |
2017-08-22 |
| 9741572 |
Method of forming oxide layer |
Chun-Wei Yu, Yu-Ying Lin, Yu-Ren Wang |
2017-08-22 |
| 9728397 |
Semiconductor device having the insulating layers cover a bottom portion of the fin shaped structure |
Hsu Ting, Chun-Wei Yu, Yu-Ren Wang |
2017-08-08 |
| 9716165 |
Field-effect transistor and method of making the same |
Yu-Ying Lin, Kuan Hsuan Ku, I-Cheng Hu, Shui-Yen Lu, Yu-Shu Lin +3 more |
2017-07-25 |
| 9646889 |
Method of removing a hard mask layer on a gate structure while forming a protective layer on the surface of a substrate |
Chun-Wei Yu, Hsu Ting, Yu-Ren Wang, Kuang-Hsiu Chen |
2017-05-09 |
| 9633904 |
Method for manufacturing semiconductor device with epitaxial structure |
Yu-Ying Lin, Yu-Ren Wang, Neng-Hui Yang |
2017-04-25 |
| 9627534 |
Semiconductor MOS device having a dense oxide film on a spacer |
Kuang-Hsiu Chen, Yi-Liang Ye, Yu-Ren Wang |
2017-04-18 |
| 9613808 |
Method of forming multilayer hard mask with treatment for removing impurities and forming dangling bonds |
Yi-Liang Ye, Kuang-Hsiu Chen, Yu-Ren Wang |
2017-04-04 |
| 9570315 |
Method of interfacial oxide layer formation in semiconductor device |
Yi-Liang Ye, Ted Ming-Lang Guo, Yu-Ren Wang |
2017-02-14 |