GP

Georg Pawlowski

AS Az Electronic Materials (Luxembourg) S.A.R.L.: 2 patents #2 of 42Top 5%
Samsung: 1 patents #6,542 of 15,326Top 45%
📍 Shizuoka, NJ: #1 of 2 inventorsTop 50%
Overall (2017): #151,961 of 506,227Top 35%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9810988 Composition for forming overlay film, and resist pattern formation method employing the same Xiaowei Wang, Masato Suzuki, Tetsuo Okayasu 2017-11-07
9804493 Composition for forming topcoat layer and resist pattern formation method employing the same Hyun-Woo Kim, Cheol-Hong Park, Tetsuo Okayasu, Xiaowei Wang, Yusuke Hama 2017-10-31