Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9821429 | Polishing pad and chemical mechanical polishing apparatus for polishing a workpiece, and method of polishing a workpiece using the chemical mechanical polishing apparatus | Kenya Ito, Shozo TAKAHASHI, Mika Suzuki | 2017-11-21 |
| 9808836 | Substrate processing apparatus | Tetsuji Togawa, Kenya Ito, Keisuke Uchiyama | 2017-11-07 |
| 9808903 | Method of polishing back surface of substrate and substrate processing apparatus | Kenya Ito, Masayuki Nakanishi, Tetsuji Togawa | 2017-11-07 |
| 9566616 | Substrate processing apparatus | Tetsuji Togawa, Kenya Ito, Keisuke Uchiyama | 2017-02-14 |
| D777546 | Work holder for polishing apparatus | Kenya Ito, Hirohiko Ueda | 2017-01-31 |