WD

Wayne J. Dunstan

AB Asml Netherlands B.V.: 2 patents #117 of 568Top 25%
Overall (2017): #95,085 of 506,227Top 20%
2
Patents 2017

Issued Patents 2017

Patent #TitleCo-InventorsDate
9755396 EUV LPP source with improved dose control by combining pulse modulation and pulse control mode Paul Frihauf, Andrew Liu, Spencer Rich, Matthew R. Graham, Steven Chang +1 more 2017-09-05
9588430 System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production Jeroen van der Burgt, Matthew R. Graham, Charles E. Kinney 2017-03-07