JW

Jen-Shiang Wang

AB Asml Netherlands B.V.: 2 patents #117 of 568Top 25%
📍 Sunnyvale, CA: #603 of 2,660 inventorsTop 25%
🗺 California: #13,043 of 60,394 inventorsTop 25%
Overall (2017): #141,466 of 506,227Top 30%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9804504 Method and apparatus for design of a metrology target Guangqing Chen, Eric Kent, Omer Abubaker Omer Adam 2017-10-31
9696635 Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process Adrianus Fransiscus Petrus Engelen, Henricus Johannes Lambertus Megens, Johannes Catharinus Hubertus Mulkens, Robert Kazinczi 2017-07-04