Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9739722 | Reflective mask blank for EUV lithography, and process for its inspection and process for its production | Hiroshi Nakanishi, Yoshiaki Ikuta | 2017-08-22 |
| 9618836 | Reflective mask blank for EUV lithography, substrate with funtion film for the mask blank, and methods for their production | Kazuyuki Hayashi | 2017-04-11 |