Issued Patents 2016
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9496395 | Semiconductor device having a strain feature in a gate spacer and methods of manufacture thereof | — | 2016-11-15 |
| 9450097 | Methods for doping Fin field-effect transistors and Fin field-effect transistor | Chun Hsiung Tsai, De-Wei Yu | 2016-09-20 |
| 9437699 | Method of forming nanowires | Yung-Ta Li, Meng-Ku Chen | 2016-09-06 |
| 9419141 | Replacement channel | Meng-Chun Chang | 2016-08-16 |
| 9412814 | Structure and formation method of FinFET device | Tung Ying Lee | 2016-08-09 |
| 9406804 | FinFETs with contact-all-around | Tung Ying Lee | 2016-08-02 |
| 9397099 | Semiconductor device having a plurality of fins and method for fabricating the same | — | 2016-07-19 |
| 9391201 | Source/drain structure and manufacturing the same | Tung Ying Lee, Winnie Victoria Wei-Ning Chen | 2016-07-12 |
| 9362386 | FETs and methods for forming the same | Chun-Hsiang Fan, Tung Ying Lee, Chi-Wen Liu | 2016-06-07 |
| 9349841 | FinFETs and methods for forming the same | Chun-Hsiang Fan, Tsu-Hsiu Perng, Chi Kang Liu, Yung-Ta Li, Ming-Huan Tsai +2 more | 2016-05-24 |
| 9318367 | FinFET structure with different fin heights and method for forming the same | Chi Kang Liu, Chi-Wen Liu | 2016-04-19 |
| 9306033 | Semiconductor device and fabrication method thereof | Chun-Fu Cheng | 2016-04-05 |
| 9293585 | Semiconductor device structure and method of forming same | Tung Ying Lee | 2016-03-22 |
| 9281307 | Plasma doping to reduce dielectric loss during removal of dummy layers in a gate structure | Chia-Pin Lin, Sheng-Hsiung Wang, Fan-Yi Hsu, Chun-Liang Tai | 2016-03-08 |
| 9263252 | Method of protecting an interlayer dielectric layer and structure formed thereby | Chun-Wei Chang, Yi-An Lin, Neng-Kuo Chen, Sey-Ping Sun, Clement Hsingjen Wann | 2016-02-16 |
| 9263586 | Quantum well fin-like field effect transistor (QWFinFET) having a two-section combo QW structure | Chun-Hsiang Fan, Yung-Ta Li | 2016-02-16 |
| 9257558 | FinFET device with gate oxide layer | Tung Ying Lee, I-Ming Chang | 2016-02-09 |
| 9257323 | Semiconductor device and method for forming the same | Tung Ying Lee, Pei-Yi Lin, Chun-Hsiang Fan, Sheng-Wen Yu, Neng-Kuo Chen +1 more | 2016-02-09 |