JP

Jong Keun Park

RM Rohm And Haas Electronic Materials: 13 patents #1 of 185Top 1%
Dow Global Technologies: 10 patents #5 of 820Top 1%
UI University Of Illinois: 1 patents #48 of 294Top 20%
Micron: 1 patents #365 of 895Top 45%
📍 Shrewsbury, MA: #2 of 143 inventorsTop 2%
🗺 Massachusetts: #62 of 12,163 inventorsTop 1%
Overall (2016): #3,767 of 481,213Top 1%
13
Patents 2016

Issued Patents 2016

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
9508549 Methods of forming electronic devices including filling porous features with a polymer Phillip D. Hustad, Emad Aqad, Mingqi Li, Cheng-Bai Xu, Peter Trefonas, III +1 more 2016-11-29
9490117 Directed self-assembly pattern formation methods and compositions Jibin Sun, Christopher Gilmore, Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III +1 more 2016-11-08
9482945 Photoresist compositions and methods of forming photolithographic patterns Christopher Nam Lee, Cecily Andes, Deyan Wang 2016-11-01
9478713 Nanostructure material methods and devices Brian T. Cunningham, Gloria G. See, Peter Trefonas, III, Kishori Deshpande, Jieqian Zhang +1 more 2016-10-25
9464224 Transformative wavelength conversion medium Kishori Deshpande, Robert E. Hefner, Jr., Peter Trefonas, III, Maurice J. Marks, Jieqian Zhang 2016-10-11
9458348 Photoresist overcoat compositions and methods of forming electronic devices Young Cheol Bae, Rosemary Bell, Seung Hyun Lee 2016-10-04
9459534 Photolithographic methods Young Cheol Bae, Rosemary Bell, Seung Hyun Lee 2016-10-04
9455177 Contact hole formation methods Phillip D. Hustad 2016-09-27
9448483 Pattern shrink methods Phillip D. Hustad, Jin Wuk Sung, James Park 2016-09-20
9418848 Methods of forming patterns with a mask formed utilizing a brush layer William R. Brown, Adam L. Olson, Kaveri Jain, Ho Seop Eom, Xue Gloria Chen +5 more 2016-08-16
9394411 Methods for annealing block copolymers and articles manufactured therefrom Shih-Wei Chang, John W. Kramer, Erin B. Vogel, Phillip D. Hustad, Peter Trefonas, III 2016-07-19
9382472 Transformative wavelength conversion medium Robert E. Hefner, Jr., Kishori Deshpande, Maurice J. Marks, Peter Trefonas, III, Jieqian Zhang 2016-07-05
9298093 Polymers, photoresist compositions and methods of forming photolithographic patterns Young Cheol Bae, Matthew M. Meyer, Jibin Sun, Seung Hyun Lee 2016-03-29