HW

Hiroyuki Wakayama

NI Nissan Chemical Industries: 1 patents #53 of 161Top 35%
📍 Toyama, JP: #111 of 274 inventorsTop 45%
Overall (2016): #379,093 of 481,213Top 80%
1
Patents 2016

Issued Patents 2016

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
9494862 Resist underlayer film forming composition containing silicon having sulfone structure and amine structure Yuta Kanno, Kenji Takase, Makoto Nakajima, Satoshi Takeda 2016-11-15