Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9500950 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura | 2016-11-22 |
| 9354523 | Composition for resist pattern-refinement, and fine pattern-forming method | Yuuko Kiridoshi, Hiroyuki Nii, Tsuyoshi Furukawa | 2016-05-31 |