Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9359276 | Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition | Yoo-Jeong Choi, Youn-Jin Cho, Yun-Jun Kim, Young Min Kim, Yong-Woon Yoon +1 more | 2016-06-07 |
| 9329475 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device | Ran NAMGUNG, Hwan-Sung Cheon | 2016-05-03 |