Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9390934 | Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device | Kazuyuki Kakuta, Toshihiko Onozuka, Shigeru Matsui, Yoshisada Ebata | 2016-07-12 |
| 9297649 | Pattern dimension measurement method and charged particle beam apparatus | Hiroki Kawada, Toru Ikegami | 2016-03-29 |