Issued Patents 2016
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9390934 | Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device | Toshihiko Onozuka, Shigeru Matsui, Yoshisada Ebata, Norio Hasegawa | 2016-07-12 |