| 9466717 |
Complex semiconductor devices of the SOI type |
Alban Zaka, Jan Hoentschel |
2016-10-11 |
| 9461145 |
OPC enlarged dummy electrode to eliminate ski slope at eSiGe |
Jan Hoentschel, Martin Gerhardt |
2016-10-04 |
| 9460955 |
Integrated circuits with shallow trench isolations, and methods for producing the same |
Nicolas Sassiat, Alban Zaka, Kun-Hsien Lin |
2016-10-04 |
| 9324869 |
Method of forming a semiconductor device and resulting semiconductor devices |
Alban Zaka, Jan Hoentschel |
2016-04-26 |
| 9324868 |
Epitaxial growth of silicon for FinFETS with non-rectangular cross-sections |
Ralf Richter, Jan Hoentschel, Hans-Jürgen Thees |
2016-04-26 |
| 9312189 |
Methods for fabricating integrated circuits with improved implantation processes |
Alban Zaka, El Mehdi Bazizi, Jan Hoentschel |
2016-04-12 |
| 9263270 |
Method of forming a semiconductor device structure employing fluorine doping and according semiconductor device structure |
Alban Zaka, Nicolas Sassiat, El Mehdi Bazizi, Jan Hoentschel |
2016-02-16 |
