Issued Patents 2016
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9285679 | Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition | Tomotaka Tsuchimura, Takuya TSURUTA, Koutarou Takahashi | 2016-03-15 |
| 9235116 | Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | Takeshi Kawabata, Tomotaka Tsuchimura | 2016-01-12 |
| 9235120 | Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask | Tomotaka Tsuchimura | 2016-01-12 |