Issued Patents 2016
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9281190 | Local and global reduction of critical dimension (CD) asymmetry in etch processing | Olivier Luere, Jinhan Choi | 2016-03-08 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9281190 | Local and global reduction of critical dimension (CD) asymmetry in etch processing | Olivier Luere, Jinhan Choi | 2016-03-08 |