Issued Patents 2016
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9305804 | Plasma etch processes for opening mask layers | Jairaj Payyapilly | 2016-04-05 |
| 9299574 | Silicon dioxide-polysilicon multi-layered stack etching with plasma etch chamber employing non-corrosive etchants | Daisuke Shimizu | 2016-03-29 |
| 9269587 | Methods for etching materials using synchronized RF pulses | Daisuke Shimizu, Katsumasa Kawasaki, Sergio Fukuda Shoji | 2016-02-23 |