Issued Patents 2011
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8029950 | Reflective mask blank for EUV lithography | Toshiyuki Uno, Ken Ebihara | 2011-10-04 |
| 8001728 | Glass run and its attaching structure | Taizo Shibata, Hideaki Minoura | 2011-08-23 |
| 8003282 | Reflective mask blank for EUV lithography, and substrate with functional film for the mask blank | Kazuo Kadowaki, Takashi Sugiyama | 2011-08-23 |
| 7906259 | Reflective mask blank for EUV lithography | Kazuo Kadowaki, Takashi Sugiyama, Masaki Mikami | 2011-03-15 |