Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8003282 | Reflective mask blank for EUV lithography, and substrate with functional film for the mask blank | Kazuyuki Hayashi, Takashi Sugiyama | 2011-08-23 |
| 7906259 | Reflective mask blank for EUV lithography | Kazuyuki Hayashi, Takashi Sugiyama, Masaki Mikami | 2011-03-15 |