Issued Patents 2011
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8039349 | Methods for fabricating non-planar semiconductor devices having stress memory | Michael Hargrove, Scott Luning | 2011-10-18 |
| 8039326 | Methods for fabricating bulk FinFET devices having deep trench isolation | Andreas Knorr | 2011-10-18 |
| 8030144 | Semiconductor device with stressed fin sections, and related fabrication methods | Scott Luning | 2011-10-04 |
| 7985639 | Method for fabricating a semiconductor device having a semiconductive resistor structure | Douglas J. Bonser | 2011-07-26 |
| 7977174 | FinFET structures with stress-inducing source/drain-forming spacers and methods for fabricating the same | Scott Luning, Michael Hargrove | 2011-07-12 |
| 7960287 | Methods for fabricating FinFET structures having different channel lengths | Richard T. Schultz | 2011-06-14 |
| 7960280 | Process method to fully salicide (FUSI) both N-poly and P-poly on a CMOS flow | Freidoon Mehrad | 2011-06-14 |
| 7943451 | Integration scheme for reducing border region morphology in hybrid orientation technology (HOT) using direct silicon bonded (DSB) substrates | Angelo Pinto | 2011-05-17 |
| 7930656 | System and method for making photomasks | Thomas J. Aton, Carl A. Vickery, James Walter Blatchford, Benjamen M. Rathsack, Benjamin P. McKee | 2011-04-19 |
| 7910422 | Reducing gate CD bias in CMOS processing | Freidoon Mehrad, Jinhan Choi | 2011-03-22 |
| 7892906 | Method for forming CMOS transistors having FUSI gate electrodes and targeted work functions | Freidoon Mehrad | 2011-02-22 |
| 7892908 | Integration scheme for changing crystal orientation in hybrid orientation technology (HOT) using direct silicon bonded (DSB) substrates | Angelo Pinto, Benjamin P. McKee, Shaofeng Yu | 2011-02-22 |