DV

David Verbaro

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #3 of 17Top 20%
📍 Monroe, NJ: #1 of 3 inventorsTop 35%
🗺 New Jersey: #1,952 of 6,350 inventorsTop 35%
Overall (2011): #318,667 of 364,097Top 90%
1
Patents 2011

Issued Patents 2011

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
7947098 Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects John Esbenshade, Andrew M Geiger, Paul Libbers, Samuel J. November, Paul J. Sacchetti +2 more 2011-05-24